Trade Lead Description:
CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.
High purity metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
High density ceramic sputtering target: ITO target, AZO target, IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN, TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc.
Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded service
| Type of Offer: |
Offer to Sell |
| Quantity: |
Not Specified |
| Packaging: |
Not Specified |
| Price / Incoterms Conditions: |
Not Specified |
Posted from China - Beijing on 15 September, 2011
Last Modified on 29 September, 2011
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