Wuxi Solution Technology Corp is afford FPD industry equipment modification and agent for new equipment, like Heat Treatment System、TSP Equipment Solution、CO2 Cleaner、OLED Evaporation System、OLED Sputter、OLED CVD、 OLED Etcher、PECVD、ALD System etc. CO2 cleaning system has been used in SAMSUNG and KYOCERA. Please refer to our website for more information. Welcome to contact us for business or other ways of Cooperation.
Sales Phone: +86-510-81880058 E-mail: wendy. dong@solutx. com
Telephone: +86-13306189603 website: www. solutx. com
CO2 cleaning system introduction: CO2 cleaning system use high-speed nozzle to spray particles (-78.5 ℃) to remove the contaminants of surface, This technology owing to the working theory of gas sublimated to complete the cleaning. The following is related cleaning tools and their features:
CO2 Tank: 1.Purifier& liquefier→CO2 snow T=-78.5℃ P=1 bar
Dry Ice Snow cleaning
Cleaning target： Particles & Organic films
Application range： Semiconductor, FPD, Precision cleaning
2.Pressing of CO2 snow T=-78.5℃ P=1 bar →Diameter 1～3mm Length 1-10mm, Hardness 2-3 Mohs, CO2 Content 99.95%
Dry Ice pellet blasting
Cleaning target： Rust, Grease, Paint removal
Application range： Semiconductor, FPD Parts Industry process
3.Prevention of static electricity Controlling Resistivity in DI water→ CO2 Anti-Static system
Application range：FPD/Semiconductor
CO2 Product Features： Features: 1. Nozzle: Slit12mm, Round Ф4mm
2. CDA (or N2), CO2, CO2 Control
3. Single hose type
Specification: Cleaning media: CO2, CDA (or N2) Application: 1. Precision module parts 2.Semiconductor parts etc.
LIQUIFIER & NOZZLES
Specification: LCO2 Gas Supply：0～0.55 kg/min (Average: 0.2 kg/min) 2.0.2
0.2 kg/min (=107 l/min) Continuous jet @40 kg, 830psi Cylinder
Use CO2 cylinder with Siphon tube inserted
CDA (or N2) ： 200l/min @ 2～6kgf/cm2 (Average 5 kgf/cm2) Purifier& Liquefier (Option) Standard Nozzle (Ф4mm) Tubing: Urebrade (Poly Ureth
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